Magnetostriction Constant of Ni Films Determined by Ferromagnetic Resonance

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The magnetostriction constant λ of thin nickel film is determined by micro-wave resonance. A thin sheet of glass on which a thin film is deposited is pulled through a nylon string. The uniaxial stress σ_u^* applied in this way to the film gives a resonance field shift. The value of λ can be determined from the resonance field shift in the film plane in the case σ_u^* is parallel to the easy axis of the film (method I), and also from the angular dependence of the resonance field shift as function of σ_u^* (method II). It is found that the value of λ for nickel films is very close to the isotropic magnetostriction constant of bulk nickel: The values obtained for a film 1,450 Å thic are -36.3x1O^<-6> (method I) and -(35.9±O.8)×10^<-6> (method II); the value for another film of 1,400 Å thickness is -38.7×10^<-6>(method I).
社団法人日本物理学会の論文
1966-05-05