Electrical Resistance of Iron Films Deposited at Liquid Nitrogen Temperature

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1965-05-15

著者

• Kato Miwako

  Department Of Applied Physics Faculty Of Engineering University Of Tokyo

• HORIKOSHI Hisashi

  Department of Applied Physics, Faculty of Engineering, University of Tokyo

• Horikoshi Hisashi

  Department Of Applied Physics Faculty Of Engineering University Of Tokyo

関連論文

• Electrical Resistance of Iron Films Deposited at Liquid Nitrogen Temperature
• Magnetostriction Constant of Ni Films Determined by Ferromagnetic Resonance
• Internal Stress and Electrical Resistivity of Evaporated Antimony Films
• Stress in Evaporated Copper Films

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