Internal Stress and Electrical Resistivity of Evaporated Antimony Films
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概要
- 論文の詳細を見る
Internal stress and electrical resistivity are simultaneously determined for evaporated antimony films during and after evaporation. At first antimony is deposited in the amorphous state. When a critical thickness is reached, the film begins to cristallize giving rise to large intrinsic stress. The dependence of stress upon film thickness, evaporation rate and substrate temperature is experimentally studied. The results can be explained by variation in the effective critical thickness, d_<eff>, which is defined as the film thickness at which crystallization of the antimony film proceeds most vigorously.
- 社団法人応用物理学会の論文
- 1963-06-15
著者
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HORIKOSHI Hisashi
Department of Applied Physics, Faculty of Engineering, University of Tokyo
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Tamura Noriko
Department of Medicine, Tokai University School of Medicine
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Horikoshi Hisashi
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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Tamura Noriko
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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