Curie Point in Thin Ni Films Determined by Electrical Method

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概要

• 論文の詳細を見る
• 社団法人日本物理学会の論文
• 1959-09-05

著者

• KUWAHARA Kaizo

  Department of Electrical Engineering, Hiroshima-Denki, Institute of Technology

• Kuwahara Kaizo

  Department Of Physics Faculty Of Science Hiroshima University

関連論文

• Measurement of Plasma Flow of Mixture of Metal Vapor and Nitrogen in Shock Wave Deposition
• Adhesion Failure of PVD Films Caused by Repeated Bending of Substrates
• Resistivity Anisotropy in Oblique Incidence Evaporated Films
• Effect of Deuteron Irradiation on the Magnetic Anisotropy of Thin Ni-Fe Films
• Curie Point in Thin Ni Films Determined by Electrical Method
• Thickness Dependence of Domain Orientation in Thin Nickel Films
• Magnetoresistance Effect in the Magnetization Reversal of Permalloy Films

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