空間フィルタを用いたウエハ異物検出技術

概要

論文の詳細を見る
An automated particle detection system for patterned wafers has been developed. A specific area of the wafer is illuminated with a laser at 45° diagonal in reference to an orientation-flat shaped on the wafer. The diffracted light is detected by an objective lens. The signal obtained by the memory-mat on a wafer is reduced to 1/8-1/15 by setting the printed spatial filter on the conjugate image plane of a Fourier transformed plane in an objective lens. By using the subtracted image signal with the spatial filter, O.5 μm standard particles on a multi-layer pattern can be detected.
公益社団法人精密工学会の論文
1992-11-05