High-Rate Reactive Deposition of SiO_2 Films Using a New DC Rotary Sputtering Cathode

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概要

• 論文の詳細を見る
• 2012-03-01

著者

• TAKAI Osamu

  Graduate School of Engineering, Nagoya University

• Takai Osamu

  Nagoya Univ. Nagoya Jpn

• Takai Osamu

  Graduate School Of Engineering Nagoya University

• KOJIMA Hiroyasu

  Earth-tech Ltd.

• SAITO Nagahiro

  Graduate School of Engineering, Nagoya University

• Saito Nagahiro

  Graduate School Of Engineering Nagoya University

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• Oxygen Gas Barrier Properties of Hydrogenated Amorphous Carbon Thin Films Deposited with a Pulse-Biased Inductively Coupled Plasma Chemical Vapor Deposition Method
• High-Rate Reactive Deposition of SiO_2 Films Using a New DC Rotary Sputtering Cathode
• Effects of Substrate Temperature on Properties of Tin-Doped Indium Oxide Films Deposited by Activated Electron Beam Evaporation
• Analysis of Atomic Force Curve Data for Mapping of Surface Properties in Water
• Radio Frequency Power Dependence in Formation of SiO:CH Thin Films by Plasma-Enhanced Chemical Vapor Deposition
• Comparison between the Mechanism of Liquid Plasma Discharge Process in Water and Organic Solution

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