Takai Osamu | Graduate School Of Engineering Nagoya University
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概要
関連著者
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Takai Osamu
Graduate School Of Engineering Nagoya University
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TAKAI Osamu
Graduate School of Engineering, Nagoya University
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Takai Osamu
Nagoya Univ. Nagoya Jpn
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KOJIMA Hiroyasu
Earth-tech Ltd.
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SAITO Nagahiro
Graduate School of Engineering, Nagoya University
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Saito Nagahiro
Graduate School Of Engineering Nagoya University
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Sirghi Lucel
Graduate School Of Engineering Nagoya University
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NAKAGIRI Nobuyuki
Nikon Corporation
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SUGIMURA Hiroyuki
Graduate School of Engineering, Nagoya University
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SAITO Nagahiro
EcoTopia Science Institute and Department of Molecular Design and Engineering, Graduate School of En
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Saito Nagahiro
EcoTopia Science Research Institute, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Baek Sang-min
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Shirafuji Tatsuru
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Cho Sung-pyo
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan
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Sugimura Hiroyuki
Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusaku, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Yoshida-Hon'machi, Sakyo, Kyoto 606-8501, Japan
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Sirghi Lucel
Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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Nakagiri Nobuyuki
Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa, Tokyo 140-8601, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
著作論文
- Oxygen Gas Barrier Properties of Hydrogenated Amorphous Carbon Thin Films Deposited with a Pulse-Biased Inductively Coupled Plasma Chemical Vapor Deposition Method
- High-Rate Reactive Deposition of SiO_2 Films Using a New DC Rotary Sputtering Cathode
- Effects of Substrate Temperature on Properties of Tin-Doped Indium Oxide Films Deposited by Activated Electron Beam Evaporation
- Analysis of Atomic Force Curve Data for Mapping of Surface Properties in Water