Fast Differential Reflectance Spectroscopy of Semiconductor Structures for Infrared Applications by Using Fourier Transform Spectrometer
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概要
- 論文の詳細を見る
Fast differential reflectance (FDR) spectroscopy has been proposed as a form of photoreflectance (PR) measurement and employed for optical investigations of type I and II quantum well structures dedicated for laser applications in the mid infrared. Differential spectra with a high signal-to-noise ratio have been achieved within times of the order of a few seconds in the 1--4 μm spectral range. We have demonstrated that the FDR technique can be successfully exploited in the fast optical characterization and investigation of semiconductor-based complex systems in the long-wavelength spectral range with an optimistic projection into the far infrared.
- Japan Society of Applied Physicsの論文
- 2010-11-25
著者
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MISIEWICZ Jan
Institute of Physics, Wroclaw University of Technology
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Misiewicz Jan
Institute Of Physics Wroclaw University Of Technology
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Motyka Marcin
Institute Of Physics Wroclaw University Of Technology
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