c-BN膜形成装置

概要

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We developed mass product type c-BN thin films coating equipment for cutting tool. Our coating method is magnetically enhanced plasma ion plating (MEP-IP). Distinction of our coating system have 100 kHz of substrate power supply frequency and stabilized plasma source for insulated c-BN coating. With these distinctions, c-BN thin film didnt peel from substrate and composition of c-BN thin film became stable. The c-BN film by using this equipment has practical deposition rate 1.0 μm/h, high hardness 4000 HK, low friction coefficient 0.17, and high performance of cutting property.
2008-07-20