In-situ Doped Embedded-SiGe Source/Drain Technique for 32nm-node pMOSFET
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
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Itokawa H.
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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OKAMOTO H.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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HOKAZONO A.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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ADACHI K.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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YASUTAKE N.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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OKAMOTO S.
System LSI Division, Toshiba Corporation Semiconductor Company
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KONDO M.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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TSUJII H.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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ISHIDA T.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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AOKI N.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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FUJIWARA M.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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KAWANAKA S.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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AZUMA A.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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TOYOSHIMA Y.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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Tsujii H.
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Azuma A.
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Toyoshima Y.
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Kawanaka S.
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Yasutake N.
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Adachi K.
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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HOKAZONO A.
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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