SOI Transistor/Power Scaling and Scaling-Strengthened Strain

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概要

• 論文の詳細を見る
• 2004-09-15

著者

• Yang Fu-liang

  Taiwan Semiconductor Manufacturing Company

• CHANG Chang-Yun

  Taiwan Semiconductor Manufacturing Company

• CHEN Hou-Yu

  Taiwan Semiconductor Manufacturing Company

関連論文

• Hot-Carrier-Induced Degradation on 0.1 μm Partially Depleted Silicon-On-Insulator Complementary Metal-Oxide-Semiconductor Field-Effect-Transistor
• New Observations on Hot-Carrier Degradation in 0.1 μm Silicon-on-Insulator n-Type Metal Oxide Semiconductor Field Effect Transistors : Semiconductors
• Strain Efficiency Enhancement with Stress Intermedium Engineering (SIE) for Sub-65nm CMOS Scaling
• SOI Transistor/Power Scaling and Scaling-Strengthened Strain
• Hot-Carrier-Induced Degradation on 0.1 μm Partially Depleted Silicon-On-Insulator Complementary Metal-Oxide-Semiconductor Field-Effect-Transistor

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