Performance and Reliability of 0.35μm/0.25μm HIMOS^【○!R】 Technology for Embedded Flash Memory Applications

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概要

• 論文の詳細を見る
• 1999-09-20

著者

• Van Houdt

  Imec

• WELLEKENS D.

  IMEC

• MAES H.

  IMEC

• VERHEYEN P.

  IMEC

• Lorenzini M.

  Imec

• FRISSON J.

  IMEC

• XUE G.

  IMEC

関連論文

• Time Dependent Anomalous Charge Loss Modeling in Flash Memories and an Accelerated Testing Procedure
• SiGe Recessed Source-Drain (RSD) Stressors for PMOS : Effect of Device Integration Flow and Increased Ge Content on Electrical Performance
• Feasibility analysis of direct tunneling through medium-κ dielectrics for embedded RAM applications
• Characteristics and Correlated Fluctuations of the Gate and Substrate Current after Oxide Soft-Breakdown
• Performance and Reliability of 0.35μm/0.25μm HIMOS^【○!R】 Technology for Embedded Flash Memory Applications

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