環状水素化炭素モノマーを用いたプラズマ支援重合膜特性への堆積温度の影響

概要

論文の詳細を見る
Plasma CVD is a candidate technology to fabricate an optical polymer waveguide. It can deposit a film on any surface geometry and any material of substrate at temperature under 200 deg.C in vacuum process. Also, it provides good thickness controllability and uniformity of the deposition film. In the present study the effects of deposition temperature on film properties, those are refractive index, deposition rate, and molecular structure, are discussed. The refractive index decreases with elevating deposition temperature. The logarithm of deposition rare increases proportionally with the reciprocal temperature and the gradient of that depends on the ratio of double bond in monomer sources. The gradient does not change by using CF4 instead of Ar as gas mixed in plasma, though the deposition rate increases about 5 times. Langmuir adsorption isotherm explains the temperature dependency of deposition rate. We speculate that the deposition rate increase due to precursor increasing by mixing CF4 to plasma and due to dangling bonds increasing in the surface of deposition film by F radicals. And we also speculate that the precursors incorporated into the polymer are selected on a substrate by absorbed sites and absorption energy.
社団法人電気学会の論文
2008-04-01