プラズマ支援重合法により形成した高分子薄膜の光吸収損失

概要

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The optical polymer waveguide fabricated by plasma enhanced polymerization, namely plasma enhanced chemical vapor deposition (PCVD), will be a candidate for a waveguide of optical interconnection and optical functional device because of flexibility, low deposition temperature, thickness controllability and low cost. The absorption of the polymer will be an important issue for those applications. That of the polymer film, a-C:H prepared by PCVD, is caused by sp2 clusters in sp3 network. In the present paper we discuss the absorption by measurement of spectral ellipsometry and with XPS signals of the valence band. As the results, optical loss of the film is lower than 1 dB/cm at 0.82 μm in wavelength. In order to decrease the loss lower than 0.1 dB/cm we need to decrease sp2 cluster size and to decrease variation of the size. Moreover, we well need to decrease branch bond in the polymer. We also believe F radical will participate in the chemical reaction of double bonds creation and annihilation in the same manner of H radical.
2009-09-01