High Thermal Conductivity of Gallium Nitride (GaN) Crystals Grown by HVPE Process
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2007-10-01
著者
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太田 弘道
茨大工
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FUKUDA Tsuguo
Institute for Materials Research, Tohoku University
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柴田 浩幸
東北大学多元物質科学研究所
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Waseda Yoshio
Institute for Advanced Materials Processing, Tohoku University
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太田 弘道
茨城大 工
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柴田 浩幸
東北大多元研
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FUJITO Kenji
Optoelectronics Laboratory, Mitsubishi Chemical Corporation
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SHIBATA Hiroyuki
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
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OHTA Hiromichi
Faculty of Engineering, Ibaragi University
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KIYOMI Kazumasa
Optoelectronics Laboratory, Mitsubishi Chemical Corporation
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SHIMOYAMA Kenji
Optoelectronics Department, Mitsubishi Chemical Corporation
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NAGAOKA Hirobumi
Optoelectronics Laboratory, Mitsubishi Chemical Corporation
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KAGAMITANI Yuji
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
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SIMURA Rayko
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
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Waseda Y
Tohoku Univ. Sendai Jpn
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Waseda Y
Institute Of Multidisciplinary Research For Advanced Materials (imram) Tohoku University
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Waseda Yoshio
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Simura Rayko
Institute Of Multidisciplinary Research For Advanced Materials (imram) Tohoku University
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Waseda Yoshio
Institute For Advanced Materials Processing (sozaiken) Tohoku University
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Waseda Yoshio
Inst. Of Multidisciplinary Res. For Advanced Materials Tohoku Univ.
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Fukuda Tsuguo
Institute Of Multidisciplinary Research For Advanced Materials (imram) Tohoku University
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Waseda Yoshio
Institute For Advanced Materials Proedding (amp) Tohoku University
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Shibata Hiroyuki
Institute For Chemical Research Kyoto University
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Ohta Hiromichi
Department Of Materials Science Ibaraki University
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Kiyomi Kazumasa
Optoelectronics Laboratory Mitsubishi Chemical Corporation
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Kagamitani Yuji
Institute Of Multidisciplinary Research For Advanced Materials (imram) Tohoku University
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Shimoyama Kenji
Optoelectronics Department Mitsubishi Chemical Corporation
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Nagaoka Hirobumi
Optoelectronics Laboratory Mitsubishi Chemical Corporation
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Waseda Y
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Fujito Kenji
Optoelectronics Laboratory Mitsubishi Chemical Corporation
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Waseda Yoshio
Institute For Advanced Materials Processing
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Fukuda Tsuguo
Institute For Material Research Tohoku University
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Shibata Hiroyuki
Institute For Advanced Materials Processing Tohoku University
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Kagamitani Yuji
Institute for Materials Research
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Fujito Kenji
Optoelectronic Laboratory, Mitsubishi Chemical Corporation, 1000 Higashi-Mamiana, Ushiku, Ibaraki 300-1295, Japan
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FUJITO Kenji
Optoelectronic Laboratory, Mitsubishi Chemical Corporation
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