CHARACTERIZATION OF A-SiGe:H FILMS DEPOSITED BY PULSE RF POWER

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概要

• 論文の詳細を見る
• 1997-12-15

著者

• Jiang Yeu-long

  Department Of Electrical Engineering National Chung Hsing University

• YEW Tzong-Yih

  Department of Electrical Engineering, National Tsing Hua University

• Yew Tzong-yih

  Department Of Electrical Engineering National Tsing Hua University

関連論文

• Very Low Temperature Deposition of Polycrystalline Si Films Fabricated by Hydrogen Dilution with Electron Cyclotron Resonance Chemical Vapor Deposition
• CHARACTERIZATION OF A-SiGe:H FILMS DEPOSITED BY PULSE RF POWER
• Fast Grain Growth of Metal-Induced Lateral Crystallization of Amorphous Silicon Using Rapid Energy Transfer Annealing
• Rapid and Efficient Recrystallization and Activation of Implanted Phosphorus Doping in Laser-Annealed Polysilicon by Rapid Energy Transfer Annealing
• Rapid Energy Transfer Annealing for the Crystallization of Amorphous Silicon

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