Lateral Diffusion Distance Measurement for 40-80nm Junctions by Etching/TEM-EELS Method
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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SAITO S.
ULSI Device Dev. Labs., NEC Corp.
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Mineji A.
Ulsi Device Development Division Nec Electron Devices Nec Corporation
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Mineji A.
Ulsi Device Development Laboratories Nec Corporation
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NISHIO N.
ULSI Device Development Division, NEC Electron Devices, NEC Corporation
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KUNIMUNE Y.
ULSI Device Development Laboratories, NEC Corporation
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KODAMA N.
ULSI Device Development Laboratories, NEC Corporation
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KIKUCHI H.
ULSI Device Development Laboratories, NEC Corporation
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TODA T.
ULSI Device Development Laboratories, NEC Corporation
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SHISHIGUCHI S.
ULSI Device Development Laboratories, NEC Corporation
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Shishiguchi S.
Ulsi Device Development Laboratories Nec Corporation
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Kunimune Y.
Ulsi Device Development Laboratories Nec Corporation
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