Oxygen Precipitation Behavior in Bonded SOI Wafers
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概要
著者
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Okonogi K.
Ulsi Device Development Labs. Nec Corporation
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KIKUCHI H.
ULSI Device Development Laboratories, NEC Corporation
関連論文
- Lateral Diffusion Distance Measurement for 40-80nm Junctions by Etching/TEM-EELS Method
- Oxygen Precipitation Behavior in Bonded SOI Wafers