High-Resolution Photoelectron Spectroscopy of Interfacial Nitrogen in Ultrathin Si Oxynitride Films
スポンサーリンク
概要
- 論文の詳細を見る
- 2001-09-25
著者
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Yeom H.
Assrc Yonsei University
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OH J.
Department of Environmental Atmospheric Sciences, Pukyong National University
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Oh J.
Department Of Applied Chemistry The University Of Tokyo
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ONO K.
Department of Applied Chemistry, University of Tokyo
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OSHIMA M.
Department of Applied Chemistry, University of Tokyo
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KIWATA H.
Department of Applied Chemistry, The University of Tokyo
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NAKAMURA K.
Department of Applied Chemistry, The University of Tokyo
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NIWA M.
Semiconductor Technology Academic Research Center
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USUDA K.
Semiconductor Technology Academic Research Center
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HIRASHITA N.
Semiconductor Technology Academic Research Center
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CHUNG Y.
ASSRC, Yonsei University
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SHIN H.
Pohang Accelerator Laboratory, Pohang University of Science and Technology
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Kiwata H.
Department Of Applied Chemistry The University Of Tokyo
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