Ruthenium Film Etching and Cleaning Process Using Cerium Ammonium Nitrate (CAN)-Nitric Acid

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概要

• 論文の詳細を見る
• 2001-09-25

著者

• AOKI H.

  ULSI Device Development Laboratories, NEC Corporation

• Iizuka T.

  Ulsi Device Development Division Nec Corporation

• WATANABE K.

  ULSI Device Development Division, NEC Corporation

• ISHIKAWA N.

  Central Research Laboratory, KANTO CHEMICAL CO., INC.

• MORI K.

  Central Research Laboratory, KANTO CHEMICAL CO., INC.

関連論文

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• A New Technique for Quantitative Analysis of Metallic Contamination inside Deep-Submicron-Diameter Holes
• Study of Cu Contamination Removal Using Electrolytic Ionized Water
• Low Temperature Recovery of Ru/(Ba, Sr)TiO_3/Ru Capacitors Degraded by Forming Gas Annealing
• Ruthenium Film Etching and Cleaning Process Using Cerium Ammonium Nitrate (CAN)-Nitric Acid

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