Post-Metal-CMP Cleaning Using Oxalic Acid

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概要

• 論文の詳細を見る
• 1998-09-07

著者

• Aoto N.

  Ulsi Device Development Laboratories Nec Corporation

• AOKI H.

  ULSI Device Development Laboratories, NEC Corporation

• YAMASAKI S.

  ULSI Device Development Laboratories, NEC Corporation

関連論文

• Post-Metal-CMP Cleaning Using Oxalic Acid
• A New Technique for Quantitative Analysis of Metallic Contamination inside Deep-Submicron-Diameter Holes
• Study of Cu Contamination Removal Using Electrolytic Ionized Water
• Ruthenium Film Etching and Cleaning Process Using Cerium Ammonium Nitrate (CAN)-Nitric Acid

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