Study of Cu Contamination Removal Using Electrolytic Ionized Water
スポンサーリンク
概要
- 論文の詳細を見る
- 1995-08-21
著者
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Aoto N.
Ulsi Device Development Laboratories Nec Corporation
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AOKI H.
ULSI Device Development Laboratories, NEC Corporation
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YAMASAKI S.
ULSI Device Development Laboratories, NEC Corporation
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SHIRAMIZU Y.
ULSI Device Development Laboratories, NEC Corporation
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IMAOKA T.
Central Laboratories, ORGANO Corporation
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FUTATSUKI T.
Central Laboratories, ORGANO Corporation
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YAMASITA Y.
Central Laboratories, ORGANO Corporation
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YAMANAKA K.
Central Laboratories, ORGANO Corporation
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Futatsuki T.
Central Laboratories Organo Corporation
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Imaoka T.
Central Laboratories Organo Corporation
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Yamasita Y.
Central Laboratories Organo Corporation
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Shiramizu Y.
Ulsi Device Development Laboratories Nec Corporation
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- Study of Cu Contamination Removal Using Electrolytic Ionized Water
- Ruthenium Film Etching and Cleaning Process Using Cerium Ammonium Nitrate (CAN)-Nitric Acid