Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-06-30

著者

• Nakano H

  Lithography Tech. Dept. Sony Corporation Msnc

• YOSHIZAWA Masaki

  Lithography Tech. Dept., Sony Corporation MSNC

• MORIYA Shigeru

  Lithography Tech. Dept., Sony Corporation MSNC

• NAKANO Hiroyuki

  Lithography Tech. Dept., Sony Corporation MSNC

• SHIRAI Yuichi

  Dept. of Physical Electronics, Tokyo Institute of Technology

• MORITA Tatsuo

  Nanotechnology Support Project, Research Center for Quantum Effect Electronics, Tokyo Institute of T

• KITAGAWA Tetsuya

  Lithography Tech. Dept., Sony Corporation MSNC

• MIYAMOTO Yasuyuki

  Dept. of Physical Electronics, Tokyo Institute of Technology

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• A New Analytical Method for Self-Force Regularization.II : Testing the Efficiency for Circular Orbits(Astrophysics and Relativity)
• Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography
• A New Analytical Method for Self-Force Regularization. I : Charged Scalar Particles in Schwarzschild Spacetime(Astrophysics and Relativity)
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• Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

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