Monte Carlo Simulation Study of Local Critical Dimension Error on Mask and Wafer

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-06-30

著者

• Ahn Byoung-sup

  Semiconductor R&d Center Samsung Electronics Co. Ltd.

• CHOI Seong-Woon

  Semicodutor R&D Center, Samsung Electronics

• SOHN Jung-Min

  Semicodutor R&D Center, Samsung Electronics

• Sohn Jung-min

  Semiconductor R&d Center Samsung Electronics Co. Ltd.

• Park Joon-soo

  Semiconductor R&d Center Samsung Electronics Co. Ltd.

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• Challenge to 0.13μm Device Patterning using KrF
• A Study of Loading Effect during Electron-Beam Exposure and Etching Process in Photomask Fabrication
• Monte Carlo Simulation Study of Local Critical Dimension Error on Mask and Wafer
• Monte Carlo Simulation Study of Local Critical Dimension Error on Mask and Wafer

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