Optimized Source/Drain Ion Implantation Conditions for P-Channel Metal-Oxide-Semiconductor Field-Effect-Transistor Formation

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Optimized Source/Drain Ion Implantation Conditions for P-Channel Metal-Oxide-Semiconductor Field-Effect-Transistor Formation
Phosphorus-Assisted Low-Energy Arsenic Implantation Technology for N-Channel Metal–Oxide–Semiconductor Field-Effect Transistor Source/Drain Formation Process
Low-$k$ Dielectric Film Patterning by X-Ray Lithography

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