The Effects of Nodular Colloidal Silica on Chemical Mechanical Polishing

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-08-15

著者

• KATODA Takashi

  Department of Electronic and Photonic Systems Engineering, Kochi University of Technology

• Kobuchi Yasushi

  Rodel-nitta Company

• HABA Shinichi

  Department of Electronic and Photonic Systems Engineering, Kochi University of Technology

• HONG Gisik

  Rodel-Nitta Company

• MORIOKA Yoshitaka

  Rodel-Nitta Company

関連論文

• Preparation and Structural Analysis of Micro-patterned Pb(Zr,Ti)O_3 Film by Metalorganic Chemical Vapor Deposition
• The Effects of Nodular Colloidal Silica on Chemical Mechanical Polishing
• Raman Spectroscopic Characterization of Tetragonal PbZr_xTi_O_3 Thin Films : A Rapid Evaluation Method for c-Domain Volume
• Characterization of Czochralski Silicon Wafers Grown at a Low Growth Rate by Photoluminescence Spectroscopy
• Fumed Silica Slurry Stabilizing Methods for Chemical Mechanical Polishing
• Electron Mobility in In_Ga_xAs Epitaxial Layer
• Role of Titanium Suicide at the Early Stage of Growth of TiO_2 on a Silicon Substrate
• The Effects of Nodular Colloidal Silica on Chemical Mechanical Polishing

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