Evaluation of the Point Defect Bulk Recombination Rate by Ion Implantation at High Temperatures
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概要
- 論文の詳細を見る
- 1992-02-25
著者
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RYSSEL Heiner
Fraunhofer Institut fuer Integrierte Schaltungen
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Ryssel Heiner
Fraunhofer-arbeitsgruppe Fur Integrierte Schaltungen
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Pichler Peter
Fraunhofer-arbeitsgruppe Fur Integrierte Schaltungen
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SCHORK Rainer
Fraunhofer-Arbeitsgruppe fur Integrierte Schaltungen
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KLAUSER Thomas
Fraunhofer-Arbeitsgruppe fur Integrierte Schaltungen
関連論文
- Microprobe Analysis of Pt Films Deposited by Beam Induced Reaction
- Microanalysis of Impurity Contamination in Masklessly Etched Area Using Focused Ion Beam
- Electron-Beam-Induced Deposition of Pt for Field Emitter Arrays
- A Computationally Efficient Method for Three-Dimensional Simulation of Ion Implantation (Special lssue on SISPAD'99)
- Evaluation of the Point Defect Bulk Recombination Rate by Ion Implantation at High Temperatures
- Transmission-Electron-Microscopy Observation of Pt Pillar Fabricated by Electron-Beam-Induced Deposition