Electrical Characterization of Al/SiN_x:H/n and p-In_<0.53>Ga_<0.47>As Structures by Deep-Level Transient Spectroscopy and Conductance Transient Techniques
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概要
- 論文の詳細を見る
- 2001-07-15
著者
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Gonzalez-diaz German
Departmento De Fisica Aplicada Iii (electricidad Y Electronica) Fac. Cc Fisicas Universidad Complute
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Duenas Salvador
Departmento De Electricidad Y Electronica E. T. S. I. Telecomunicacion Campus "miguel Delibes&q
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Castán Helena
Departamento de Electricidad y Electrónica, E.T.S.I. Telecomunicación, Campus “Miguel Delibes”, Univ
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Barbolla Juan
Departamento de Electricidad y Electrónica, E.T.S.I. Telecomunicación, Campus “Miguel Delibes”, Univ
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Mártil Ignacio
Departamento de Física Aplicada III (Electricidad y Electrónica), Fac. CC Físicas, Universidad Compl
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BLANCO Nieves
Departamento de Fisica Aplicada III (Electricidady Electronica), Facultad de Ciencias Fisicas, Unive
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Barbolla Juan
Departmento De Electricidad Y Electronica E. T. S. I. Telecomunicacion Campus "miguel Delibes&q
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Blanco Nieves
Departamento De Fisica Aplicada Iii (electricidady Electronica) Facultad De Ciencias Fisicas Univers
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GONZALEZ-DIAZ German
Departamento de Fisica Aplicada III(Electricidad y Electronica), Facultad de Ciencias Fisicas, Universidad Complutense
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Duenas Salvador
Department Electricidad y Electrdnica, ETSI Telecomunicacion, Universidad de Valladolid, Campus Miguel Delibes s-n
関連論文
- Electrical Characterization of Al/SiN_x:H/n and p-In_Ga_As Structures by Deep-Level Transient Spectroscopy and Conductance Transient Techniques
- Electrical Characterization of Low Nitrogen Content Plasma Deposited and Rapid Thermal Annealed Al/SiN_x : H/InP Metal-Insulator-Semiconductor Structures
- Conductance Transient Comparative Analysis of Electron-Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposited SiNx, SiO2/SiNx and SiOxNy Dielectric Films on Silicon Substrates
- Interfacial State Density and Conductance-Transient Three-Dimensional Profiling of Disordered-Induced Gap States on Metal Insulator Semiconductor Capacitors Fabricated from Electron-Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposited SiOxNyHz Fil
- Experimental Verification of Direct Tunneling Assisted Electron Capture of Disordered-Induced Gap States in Metal-Insulator-Semiconductor Structures
- Sub-Bandgap External Quantum Efficiency in Ti Implanted Si Heterojunction with Intrinsic Thin Layer Cells