Conductance Transient Comparative Analysis of Electron-Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposited SiNx, SiO2/SiNx and SiOxNy Dielectric Films on Silicon Substrates
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概要
- 論文の詳細を見る
An interface quality comparative study of metal-insulator-semiconductor (MIS) structures based on SiNx, SiO2/SiNx and SiOxNy dielectric films deposited on silicon substrates by electron-cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) has been carried out. Overall interpretation of deep-level transient spectroscopy (DLTS) and conductance transient (G-t) measurements enables us to conclude that the interface quality of Al/SiOxNy/Si MIS structures is superior to those of Al/SiNx/Si devices. Moreover, we have proved that thermal treatments applied to Al/SiOxNy/Si capacitors induce defect passivation, possibly related to the presence of hydrogen in the films, and disorder-induced gap-state (DIGS) density maxima can decrease to values even lower than those corresponding to Al/SiNx/SiO2/Si devices.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-01-15
著者
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Gonzalez-diaz German
Departmento De Fisica Aplicada Iii (electricidad Y Electronica) Fac. Cc Fisicas Universidad Complute
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Duenas Salvador
Departmento De Electricidad Y Electronica E. T. S. I. Telecomunicacion Campus "miguel Delibes&q
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Del Prado
Departmento De Fisica Aplicada Iii (electricidad Y Electronica) Fac. Cc Fisicas Universidad Complute
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Castán Helena
Departamento de Electricidad y Electrónica, E.T.S.I. Telecomunicación, Campus “Miguel Delibes”, Univ
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Barbolla Juan
Departamento de Electricidad y Electrónica, E.T.S.I. Telecomunicación, Campus “Miguel Delibes”, Univ
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San Andrés
Departamento de Física Aplicada III (Electricidad y Electrónica), Fac. CC Físicas, Universidad Compl
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Mártil Ignacio
Departamento de Física Aplicada III (Electricidad y Electrónica), Fac. CC Físicas, Universidad Compl
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Barbolla Juan
Departmento De Electricidad Y Electronica E. T. S. I. Telecomunicacion Campus "miguel Delibes&q
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