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Tokyo Institute of Technology, Graduate School | 論文

• Structure of Polycrystalline Silicon Thin Film Fabricated from Fluorinated Precursors by Layer-by-Layer Technique
• Structural and Electrical Properties of n-Type Poly-Si Films Prepared by Layer-by-Layer Technique
• Preparation of High-Quality Microcrystalline Silicon from Fluorinated Precursors by a Layer-by-Layer Technique
• Study on Chemical Reactions on the Growing Surface to Control the Structures of μc-Silicon from Fluorinated Precursors
• Preparation of μc-Si:H/a-Si:H Multilayers and Their Optoelectric Properties

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