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The Institute of Scientific and industrial Research, Osaka University | 論文
- Atomic Force Microscopy Observation of Stretched DNA on Graphite Surfaces
- Internal Friction Due to Localized Relaxation around Y-ions in Single Crystal Yttria-Stabilized Zirconia : Structure and Mechanical and Thermal Properties of Condensed Matter
- Ultrasonic Attenuation Due to Localized Relaxation in Cubic Yttria-Stabilized Zirconia
- Formation of Two Dimensional Network Structure of DNA Molecules on Highly Ordered Pyrolytic Graphite Surface
- Formation of Two-Dimensional Network Structure of DNA Molecules on Si Substrate : Atoms, Molecules, and Chemical Physics
- Helical Poly(aryl isocyanide)s Possessing Chiral Alkoxycarbonyl Groups
- Immobilization of Probe DNA on Ta_2O_5 Thin Film and Detection of Hybridized Helix DNA using IS-FET
- Preparation of Iron Ultrafine Particles by the Dielectric Breakdown of Fe(CO)_5 Using a Transversely Excited Atmospheric CO_2 Laser and Their Characteristics
- Self-Aligned Pocket Implantation into Elevated Source/Drain MOSFETs for Reduction of Junction Capacitance and Leakage Current
- Parasitic Resistance Reduction in Deep Submicron Dual-Gate Transistors with Partially Elevated Source/Drain Extension Regions Fabricated by Complementary Metal-Oxide-Semiconductor Technologies
- Preparation of γ-Iron Ultrafine Particles Using a Transversely Excited Atmospheric CO_2 Laser
- Direct Observation of ^O Tracer Diffusion in a YBa_2Cu_3O_y Single Crystal by Secondary Ion Mass Spectrometry
- A Super-Flexible Sensor System for Humanoid Robots and Related Applications(Selected Papers in ICEP 2007)
- 2P-123 シンプルな光学系で高時間・高空間分解能を実現する暗視野顕微鏡の開発(分子モーター,第47回日本生物物理学会年会)
- Anti-Surfactant in III-Nitride Epitaxy : Quantum Dot Formation and Dislocation Termination
- Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness
- Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75keV Electron Beam
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists