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Sony Corp. Atsugi Jpn | 論文
- Formation of SiN Films by Plazma-Enhanced Chemical Vapor Deposition Using [(CH_3)_2N]_3SiN_3
- Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System
- Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O_2/He, and TEOS/O_3/He Systems
- Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO_2 Films Using Tetraethylorthosilicate (TEOS)
- Formation of Dielectric Films for Gap-Filling by NH_3-Added H_2O-Tetraethoxysilane Plasma Chemical Vapor Deposition
- 30pXD-10 収束電子回折法による局所歪み測定法の研究 II
- Carbon Microfibers Grown on Graphite Electrode During Fullerene Generation Using Composite Graphite Rods
- Structures of Carbon Deposits Formed on a Graphite Electrode durirng Fullerene Generation
- Numerical Investigations on Requirements for BARK Materials for Hyper NA Immersion Lithography
- Optical Recording Characteristics of Dye/Polymer Systems
- Effect of the Blending of Binder Polymers on Recording Sensitivity of Dye/Polymer Optical Recording Media