スポンサーリンク
Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd. | 論文
- Optical Proximity Correction Using Diffused Aerial Image Model
- Optical Proximity Correction Using Diffused Aerial Image Model
- Optical Proximity Correction Using Diffused Aerial Image Model
- 光近接補正にたいする超薄膜レジストの近似モデル
- TiN Etching and Its Effects on Tungsten Etching in SF_6/Ar Helicon Plasma
- Effect of Additive Gases on Dimension Control during Cl_2-Based Polysilicon Gate Etching
- Negative Ion Formation in SiO_2 Etching Using a Pulsed Inductively Coupled Plasma
- Gate Oxide Degradation during Polysilicon Etching in a Parallel Plate Plasma Type Etcher