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Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology | 論文
- Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method
- Observations of Island Structures at the Initial Growth Stage of PbZr_xTi_O_3 Thin Films Prepared by Metalorganic Chemical Vapor Deposition
- High-Quality Growth of AlN Epitaxial Layer by Plasma-Assisted Molecular-Beam Epitaxy : Semiconductors
- EFFECT OF PARTICLE SIZE AND HEATING TEMPERATURE OF CERAMIC POWDERS ON ANTIBACTERIAL ACTIVITY OF THEIR SLURRIES
- EFFECT OF CERAMIC POWDER SLURRY ON SPORES OF BACILLUS SUBTILIS
- MUTAGENICITY TEST OF CERAMIC POWDER WHICH HAVE GROWTH INHIBITORY EFFECT ON BACTERIA
- INJURY OF Escherichia coli IN PHYSIOLOGICAL PHOSPHATE-BUFFERED SALINE INDUCED BY FAR-INFRARED IRRADIATION
- EVALUATION OF GROWTH INHIBITORY EFFECT OF CERAMICS POWDER SLURRY ON BACTERIA BY CONDUCTANCE METHOD
- Arsenic Pressure Dependence of Surface Diffusion of Ga on Nonplanar GaAs Substrates
- Computer Simulation for Analysis of Lattice Polarity of Wurtzite GaN{0001} Film by Coaxial Impact Collision Ion Scattering Spectroscopy
- Terminating Structure of Plasma-Assisted Molecular Beam Epitaxial GaN{0001} Film Surface Identified by Coaxial Impact Collision Ion Scattering Spectroscopy
- Identification of Surface Atoms of LiGaO_2(001) Substrate for Hexagonal GaN Film by Coaxial Impact Collision Ion Scattering Spectroscopy
- Intergration of Terraced Laser Diode and Garnet Crystals by Wafer Direct Bonding
- Pb(Zr, Ti)O_3薄膜を用いたMFIS構造における絶縁体膜の検討 : C-V 及び DLTS法による界面準位密度の測定
- Pb(Zr, Ti)O_3薄膜を用いたMFIS構造における絶縁体膜の検討 : C-V及びDLTS法による界面準位密度の測定
- MOCVD-Pb(Zr,Ti)O_3薄膜の電気的特性のグレインサイズ依存性
- MOCVD-Pb(Zr,Ti)O_3薄膜の電気的特性のグレインサイズ依存性
- Crystalline and Ferroelectric Properties of Pb(Zr, Ti)O_3 Thin Films Grown by Low-Temperature Metalorganic Chemical Vapor Deposition
- Epitaxial Growth and Ferroelectric Properties of the 20-nm-Thick Pb(Zr, Ti)O_3 Film on SrTiO_3(100) with an Atomically Flat Surface by Metalorganic Chemical Vapor Deposition
- Low-Temperature Fabrication of Ir/Pb(Zr,Ti)O_3/Ir Capacitors Solely by Metalorganic Chemical Vapor Deposition