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Novellus Systems, Inc. | 論文
- Carbon Contamination Levels in Plasma-Enhanced Chemical Vapor Deposited Fluorinated Silica Glasses
- Two Approaches to the Development of Low k Systems ; Parylene AF-4, and Fluorinated Amorphous Carbon
- Carbon Doped Silicon Oxide Films for Sub-0.25μm Technology Interconnect Isolation
- Plasma Enhanced Chemical Vapor Deposition and Characterization of Fluorine Doped Silicon Dioxide Films
- Intermetal Dielectric Gap Fill by Plasma Enhanced Chemical Vapor Deposited Fluorine-Doped Silicon Dioxide Films