Two Approaches to the Development of Low k Systems ; Parylene AF-4, and Fluorinated Amorphous Carbon

スポンサーリンク

概要

• 論文の詳細を見る
• 1997-06-05

著者

• Kelly John

  Novellus Systems Inc.

• Plano Mary

  Novellus Systems Inc.

• HARRUS Alain

  Novellus Systems, Inc.

• KUMAR Devendra

  Novellus Systems, Inc.

• MOUNTSIER Tom

  Novellus Systems, Inc.

• Harrus A

  Compass Venture Partners In Menlo Park California

• Kumar Devendra

  Novellus Systems Inc.

• Mountsier T

  Novellus Systems Inc.

• Mountsier Tom

  Novellus Systems Inc.

関連論文

• Two Approaches to the Development of Low k Systems ; Parylene AF-4, and Fluorinated Amorphous Carbon
• Carbon Doped Silicon Oxide Films for Sub-0.25μm Technology Interconnect Isolation

スポンサーリンク