Carbon Doped Silicon Oxide Films for Sub-0.25μm Technology Interconnect Isolation

スポンサーリンク

概要

• 論文の詳細を見る
• 1999-12-09

著者

• Plano Mary-anne

  Novellus Systems Inc.

• MOUNTSIER Tom

  Novellus Systems, Inc.

• NAG Somnath

  Novellus Systems Inc.

• SHI Jianou

  Novellus Systems Inc.

• Mountsier Tom

  Novellus Systems Inc.

関連論文

• Two Approaches to the Development of Low k Systems ; Parylene AF-4, and Fluorinated Amorphous Carbon
• Carbon Doped Silicon Oxide Films for Sub-0.25μm Technology Interconnect Isolation

スポンサーリンク