Plasma Enhanced Chemical Vapor Deposition and Characterization of Fluorine Doped Silicon Dioxide Films

スポンサーリンク

概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-01-01

著者

• Yoo Woo

  Novellus Systems Inc.

• Swope Richard

  Novellus Systems Inc.

• MORDO David

  Novellus Systems, Inc.

• Mordo David

  Novellus Systems Inc.

関連論文

• Carbon Contamination Levels in Plasma-Enhanced Chemical Vapor Deposited Fluorinated Silica Glasses
• Plasma Enhanced Chemical Vapor Deposition and Characterization of Fluorine Doped Silicon Dioxide Films
• Intermetal Dielectric Gap Fill by Plasma Enhanced Chemical Vapor Deposited Fluorine-Doped Silicon Dioxide Films

スポンサーリンク