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New Industry Creation Hatchery Center Tohoku University | 論文
- Extracting person's speech individually from original records of meeting by speaker identification technique
- 屋上広告板のピーク風力係数
- 屋根および軒の風力係数とガスト影響係数
- Comparative Study on the Toxic Effects of Red Tide Flagellates Heterocapsa circularisquama and Chattonella marina on the Short-Necked Clam (Ruditapes philippinarum)
- 設計者のための風力係数の充実
- SiO_2/Si(111) Interface Structures Formed by Atomic Oxygen
- BLOOD-BRAIN BARRIER EFFLUX TRANSPORTERS : NEW CONCEPTS OF BARRIER FUNCTION
- Hole Mobility in Accumulation Mode Metal-Oxide-Semiconductor Field-Effect Transistors (Special Issue : Solid State Devices and Materials (2))
- A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region
- Gas Flow Characteristics in a Plasma Process Chamber and Proposal of New Pulse-Controlled Gas Injection Method Using Interference Matrix Operation for Rapid Stabilization of Gas Pressure
- Low temperature (300℃) growth of crystalline/non-crystalline thin Si films by a newly developed single shower dual injection system employing microwave excited high density hydrogen plasma and silicon radicals CVD process
- Microbial resistance in relation to catalase activity to oxidative stress induced by photolysis of hydrogen peroxide
- In vitro and in vivo anti-Staphylococcus aureus activities of a new disinfection system utilizing photolysis of hydrogen peroxide
- Topical treatment of oral cavity and wounded skin with a new disinfection system utilizing photolysis of hydrogen peroxide in rats
- Deposition of Microcrystalline Si1-xGex by RF Magnetron Sputtering on SiO2 Substrates
- Impact of Tungsten Capping Layer on Yttrium Silicide for Low-Resistance n+-Source/Drain Contacts
- Terahertz Response of Bi2212 Intrinsic Josephson Junctions
- Lattice Distortion at SiO2/Si(001) Interface Studied with High-Resolution Rutherford Backscattering Spectroscopy/Channeling
- Very Low Bit Error Rate in Flash Memory Using Tunnel Dielectrics Formed by Kr/O2/NO Plasma Oxynitridation
- Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes