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Mitsubishi Electric Corp. Hyogo Jpn | 論文
- DLTS Study of Electron Traps in n-GaAs Grown by Gas Source Molecular Beam Epitaxy Using Triethylgallium and AsH_3
- Characteristics of the Switching in a Superconducting Y-Ba-Cu-O Thin Film by Laser Irradiation
- DC Superconducting Quantum Interference Devices with BiSrCaCuO Bicrystal Grain Boundary Junctions at 77 K
- Ba_K_xBiO_3 Grain Boundary Junctions on a MgO Bicrystal Substrate
- Hysteretic Josephson Junction Behavior of Ba_K_xBiO_3 Grain Boundary Junctions Using SrTiO_3 Bicrystal Substrates
- Dielectric Properties of (Ba,Sr)TiO_3 Thin Films Deposited by RF Sputtering
- SiO_2 Etching Characteristics with Low-Energy Ions Generated by Electron Cyclotron Resonance Plasma Using CF_4 and NF_3 Gases
- High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient : Etching
- High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient
- Highly Selective AlSiCu Etching Using BBr_3 Mixed-Gas Plasma : Etching and Deposition Technology
- ECR Plasma Etching with Heavy Halogen Ions : Etching and Deposition Technology
- Highly Selective AlSiCu Etching Using BBr_3 Mixed-Gas Plasma
- ECR Plasma Etching with Heavy Halogen Ions
- A Vision Chip with Column-Level Amplification of Optical Data Signals for Indoor Optical Wireless Local Area Networks
- Preliminary Demonstration of 1.0V CMOS Imager with Semi-Pixel-Level ADC Based on Pulse-Width-Modulation Pixel Readout(VLSI Technology toward Frontiers of New Market)
- Development of a CMOS-based Neural Imaging and Interface Device
- Development of a multi-chip retinal stimulator for in vivo experiments toward retinal prosthesis
- CMOS Optical Polarization Analyzer Chip for μTAS
- Large scale electrode array based on distributed microchip architecture for retinal prosthesis
- Development of a CMOS Image Sensor for Real Time In Vivo Imaging of the Protease Activity Inside the Mouse Hippocampus