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Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology | 論文
- Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU
- Actinic Mask Inspection Using an EUV Microscope : Preparation of a Mirau Interferometer for Phase-Defect Detection
- Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
- Human Skeletal Muscle Contractile Properties Assessed by Mechanomyogram during Experimentally-induced Hypothermia and Muscle Fatigue
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Near Edge X-Ray Absorption Fine Structure Study for Optimization of Hard Diamond-Like Carbon Film Formation with Ar Cluster Ion Beam
- Optimum Incident Angle of Ar Cluster Ion Beam for Superhard Carbon Film Deposition
- Optical Thin Film Formation with O_2 Cluster Ion Assisted Deposition
- Ultra-Smooth Surface Preparation Using Gas Cluster Ion Beams
- Surface Modification of Fluorocarbon Polymers by Synchrotron Radiation
- Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
- Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
- Coherent X-ray Generation by NewSUBARU, Synchrotron Radiation Facility
- Research Activity on Development and Application of LIGA Technology at New SUBARU, 1.5 GeV Synchrotron Radiation Facility
- Femtosecond Snapshot Holography with Extended Reference Using Extreme Ultraviolet Free-Electron Laser