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Laboratory Of Advanced Science And Technology For Industry University Of Hyogo | 論文
- Fabrication of Diffraction Grating with High Aspect Ratio Using X-ray Lithography Technique for X-ray Phase Imaging
- Novel Interatomic Potential Energy Function for Si, O Mixed Systems
- Fabrication of a Micro Capacitive Inclination Sensor by Resin Molding
- X-Ray Phase Imaging with Single Phase Grating
- Phase Tomography by X-ray Talbot Interferometry for Biological Imaging
- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU
- Actinic Mask Inspection Using an EUV Microscope : Preparation of a Mirau Interferometer for Phase-Defect Detection
- Cation Distribution and Structural Instability in Bi_La_xTi_3O_
- Raman Spectroscopic Fingerprint of Ferroelectric SrBi_2Ta_2O_9 Thin Films: A Rapid Distinction Method for Fluorite and Pyrochlore Phases : Electrical Properties of Condensed Matter
- Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
- Miniature Two-Axis Actuator for High-Data-Transfer-Rate Optical Data Storage System
- Characterization of Ferroelectric Property of C-Axis- and Non-C-Axis-Oriented Epitaxially Grown Bi_2VO_ Thin Films : Electrical Properties of Condonsed Matter
- Human Skeletal Muscle Contractile Properties Assessed by Mechanomyogram during Experimentally-induced Hypothermia and Muscle Fatigue
- Soft X-Ray Reduction Lithography Using Multilayer Mirrors : X-Ray Lithography
- Soft X-Ray Reduction Lithography Using Multilayer Mirrors
- Investigation of High-Strength Electroformed Ni for Microprobes(Recent Advances in Materials and Processing [II])
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Near Edge X-Ray Absorption Fine Structure Study for Optimization of Hard Diamond-Like Carbon Film Formation with Ar Cluster Ion Beam