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Faculty of Engineering Niigata University | 論文
- タンタル系層状ペロブスカイトのリチウムインタ-カレ-ション
- Li2CrTi(PO4)3 のリチウムインタ-カレ-ションと正極特性
- Preparation of High Lithium Ion Conducting LiLnSiO_4(Ln=La, Sm)Thin Films by Sol-Gel Method
- Hysteresis-Free Amorphous Chiral Nematic Reflective Guest-Host Liquid Crystal Displays
- Identification of Control Parameters for Brass Player's Embouchure by Measuring Contact Pressure on the Teeth Buccal Surface
- Measurement of Dynamic Surface Tension of Surfactant Solutions
- Twist Resulting in High Strength Steel Sheet Hat Channel Product Consisting of Straight Portion Combined with Curved Portion
- 520 Press forming of high tensile strength steel sheet : Hat channel product combined straight part with curved part in longitudinal direction
- Nitrogen Doping into Cu_2O Thin Films Deposited by Reactive Radio-Frequency Magnetron Sputtering
- Nitrogen Doping into Cu_2O Thin Films Deposited by Reactive Sputtering Method
- Thin-Film Deposition of Cu_2O by Reactive Radio-Frequency Magnetron Sputtering
- Influence of Puled Electron Cyclotron Resonance Plasma on Gate Electrode Etching
- Reduction of Charge Build-up with High-Power Pulsed Electron Cyclotron Resonance Plasma
- Evaluation of Electron Shading Charge Buildup Damage Using Metal-Nitride-Oxide-Silicon Capacitors
- Etching Characteristics of WSi_2 with Pulsed-Electron Cyclotron Resonance Plasma
- Precise Evaluation of Pattern Distortion with Variation of the Impurity Concentration and Conductivity of Silicon Films
- SiO_2 Etching in C_4F_8/O_2 Electron Cyclotron Resonance Plasma
- Analysis of Fluorocarbon Deposition during SiO_2 Etching
- Pulsed Plasma Processing for Reduction of Profile Distortion Induced by Charge Buildup in Electron Cyclotron Resonance Plasma
- Profile Control of poly-Si Etching in Electron Cyclotron Resonance Plasma