スポンサーリンク
Faculty Of Pharmacy And Parmaceutical Sciences Fukuyama University | 論文
- RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
- Indonesian Medicinal Plants. XX. Chemical Structures of Eleuthosides A, B, and C, Three New Aromatic Glucosides from the Bulbs of Eleutherine palmifolia (Iridaceae)
- SEARCH FOR NATURAL AND SYNTHETIC IONOPHORES : EXPLOITATION OF NEW METHODS FOR MEASUREMENT OF ION-TRANSPORT AND ION-BINDING ACTIVITIES AND ION-PERMEABILITY
- 0.13μm Metal-Oxide-Nitride-Oxide-Semiconductor Single Transistor Memory Cell with Separated Source Line
- Analysis of Carrier Traps in Si_3N_4N_4 in Oxide/Nitride/Oxide for Metal/Oxide/Nitride/Oxide/Silicon Nonvolatile Memory
- Development of Sub-Quarter-μm MONOS (metal/oxide/nitride/oxide/semiconductor)Type Memory Transistor
- Development of Sub-Quarter-μm MONOS Type Memory Transistor
- Heat Transfer and Granule Growth Rate in Fluidized Bed Granulation
- COMPUTER SIMULATION OF FLUIDIZED BED GRANULATION BY A TWO-DIMENSIONAL RANDOM COALESCENCE MODEL