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Faculty Of Engineering Hiroshima University | 論文
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
- Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields : Etching and Deposition Technology
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields
- Zinc Isotope Effects in Benzo Crown Resin by Displacement Chromatography
- Zinc Isotope Fractionation on Benzo-15-crown-5 Resin by Liquid Chromatography
- A Study on Zinc Isotope Fractionation in a Benzo Crown Resin/Acetone System
- Zinc Isotope Accumulation in Liquid Chromatography with Crown Ether Resin
- Novel Syntheses Method of Phenol Type Benzo-15-Crown-5 Ether Resin and its Application for Lithium Isotope Separation
- Zinc Isotope Separation by Phenol Formaldehyde Type 15-Crown-5 Resin in Organic Solvents
- Separation of vanadium isotopes by ion-exchange chromatography
- Nitrogen Isotope Separation by Means of Cation Exchange Resin, (I) Effects of Eluent Concentration
- Contact Ionization Ion Sources for Ion Cyclotron Resonance Separation ( Plasma Processing)
- Numerical Study of Flow and Thrust Produced by Heaving and Combined Oscillation of 2D Hydrofoil