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Department of Physics, University of Seoul | 論文
- Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
- X-Ray Photoelectron Spectroscopy Study of Pt-Oxide Thin Films Deposited by Reactive Sputtering Using O_2/Ar Gas Mixtures
- Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma
- High Transmittance SiC Membrane Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition in Combination with Rapid Thermal Annealing
- Chemical and Structural Stabilities of SiN_x Nano-Scale Islands Formed by Ionized N_2 Gas at Room Temperature
- Photoluminescence and Electroluminescence Properties of The Er-doped Silicon-Rich Silicon Oxide Films deposited by Pulsed Laser Deposition Technique