スポンサーリンク
Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan | 論文
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
- Molecular Detection in a Microfluidic Device by Streaming Current Measurements
- Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
- Healthcare Chip for Checking Health Condition from Analysis of Trace Blood Collected by Painless Needle
- Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition
- 95 K NdBCO Single Crystal Grown in Air by Controlling Liquid Compositiorn
- Biochip Which Examines Hepatic Function by Employing Colorimetric Method
- 18F-fluoromisonidazole positron emission tomography before treatment is a predictor of radiotherapy outcome and survival prognosis in patients with head and neck squamous cell carcinoma
- Surface Reaction Kinetics of InP and InAs Metalorganic Vapor Phase Epitaxy Analyzed by Selective Area Growth Technique
- Zn and S Doping in GaAs Selective Area Growth by Metal–Organic Vapor Phase Epitaxy
- Simulation of Noncontact Atomic Force Microscopy of Hydrogen- and Methyl-Terminated Si(001) Surfaces
- Adsorption of Benzene on Si(001) from Noncontact Atomic Force Microscopy Simulation
- Material Consideration on Ta, Mo, Ru, and Os as Glue Layer for Ultra Large Scale Integration Cu Interconnects
- Electrical Properties of Thick Epitaxial Silicon Films Deposited at High Rates and Low Temperatures by Mesoplasma Chemical Vapor Deposition
- Kinetic Analysis of InAsP by Metalorganic Vapor Phase Epitaxy Selective Area Growth Technique
- In situ Observation of Initial Nucleation and Growth Processes in Supercritical Fluid Deposition of Copper
- Tight-Binding Analysis of Surface Electronic Conduction Measured with Micro-Multipoint Scanning Tunneling Microscopy Probes
- Effects of Ag Addition on the Resistivity, Texture and Surface Morphology of Cu Metallization
- Dependence of Electric Properties of Al Atomic Chains on Structure of Chain–Electrode Junction
- Cavity Ring-Down Spectroscopy Measurement of H(n=2) Density in Mesoplasma for Fast-Rate Silicon Epitaxy