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Department of Electronics Engineering, National Taiwan University of Science and Technology | 論文
- Low-Temperature Process to Improve the Leakage Current of (Ba, Sr)TiO_3 Films on Pt/TiN/Ti/Si Substrates
- Effects of Post-Oxygen Plasma Treatment on Pt/(Ba,Sr)TiO_3/Pt Capacitors at Low Substrate Temperatures
- Effects of Rapid Thermal Annealing on Cobalt Silicided p^+ poly-Si Gates Fabricated by BF^+_2 Implantation into Bilayered CoSi/a-Si Films
- Effects of Ni Silicidation on the Shallow p^+n Junctions Formed by BF^+_2 Implantation into Thin Polycrystalline-Si Films on Si Substrates
- Formation of Shallow p^+n Junctions Using Different Annealing Schemes with Low Thermal Budget
- Effects of Phosphorus Dopant on the Thermal Stability of Thin Pd_2Si and PtSi Silicide Films on (100) Si Substrates