スポンサーリンク
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan | 論文
- Successful One-stage Surgical Removal of Intravenous Uterine Leiomyomatosis with Right Heart Extension
- High-resolution MRI using a microscopy coil for the diagnosis of recurrent lateral patellar dislocation
- Expression of Vascular Endothelial Growth Factor and E-Cadherin in Human Ovarian Cancer : Association with Ascites Fluid Accumulation and Peritoneal Disseminatin in Mouse Ascites Model
- Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-$k$ Films in H2/N2 Plasma Etching
- Adaptive Force Control for Unknown Environment Using Sliding Mode Controller with Variable Hyperplane(Advances in Motion and Vibration Control Technology)
- ADAPTIVE FORCE CONTROL FOR UNKNOWN ENVIRONMENT USING SLIDING MODE CONTROLLER WITH VARIABLE HYPERPLANE
- Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma
- Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F2/Ar Gases
- Full Three-Dimensional Simulation of Ion-Sensitive Field-Effect Transistor Flatband Voltage Shifts Due to DNA Immobilization and Hybridization
- Surface Modification Process of Contact Lens Using Three-Phase AC Excited Nonequilibrium Atmospheric Pressure Ar Plasma
- Novel Silicon Wafer Slicing Technology Using Atmospheric-Pressure Reactive Microplasma
- Effect of Self-Assembled Monolayer on Electroluminescence Properties of Organic Light-Emitting Diodes
- Polycrystallization of Vaporized Hole-Transport Materials for Organic Light-Emitting Diodes and Its Suppression Using Organic Alloy Method
- The Natural Degeneration Course in the T1rho Values of Normal Knee Cartilage
- Modification of Ionization Potential of Poly(ethylene dioxythiophene):Poly(styrene sulfonate) Film by Acid or Base Treatment
- Lost Hole-Blocking Property of Blue-Emitting Alq by Inserting Detached Layer
- A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma