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Department of Advanced Materials Engineering, Sejong University | 論文
- Control-free Air Vent System for Ultra-low Volume Sample Injection on a Microfabricated Device
- Effect of N_2O to C_4F_8/O_2 on Global Warming during Silicon Nitride Plasma Enhanced Chemical Vapor Deposition (PECVD) Chamber Cleaning Using a Remote Inductively Coupled Plasma Source : Nuclear Science, Plasmas, and Electric Discharges
- C_4F_8O/O_2/N-based Additive Gases for Silicon Nitride Plasma Enhanced Chemical Vapor Deposition Chamber Cleaning with Low Global Warming Potentials
- Undergate-type Triode Carbon Nanotube Field Emission Display With a Microchannel Plate : Surfaces, Interfaces, and Films
- Growth of Vertically Aligned Carbon Nanotubes inside Dome-structured Amorphous Silicon Holes by Plasma-enhanced Chemical Vapor Deposition
- Pressure-Driven Sample Injection with Quantitative Liquid Dispensing for On-Chip Electrophoresis
- Effect of Catalytic Layer Thickness on Growth and Field Emission Characteristics of Carbon Nanotubes Synthesized at Low Temperatures Using Thermal Chemical Vapor Deposition
- Removal of Hydrogen Sulfide by Sulfate-Resistant Acidithiobacillus thiooxidans AZ11(ENVIRONMENTAL BIOTECHNOLOGY)
- Biological Deodorization of Hydrogen Sulfide Using Porous Lava as a Carrier of Thiobacillus thiooxidans
- Effect of Ion Bombardment on Microstructures of Carbon Nanotubes Grown by Electron Cyclotron Resonance Chemical Vapor Deposition at Low Temperatures
- Effect of N2O Flow Rate on Reliability of SiOx Films Deposited by SiH4–N2O Gas Mixture Plasma
- Evaluation of Reliability of Transparent SiOCH by Electrochemical Methods
- Field Emission Characteristics of Pattern-grown Carbon Nanotubes
- Growth of Vertically Aligned Carbon Nanotubes inside Dome-structured Amorphous Silicon Holes by Plasma-enhanced Chemical Vapor Deposition